Abstrak 
Reduction Kinetics of Thermally Reduced Graphene Oxide Thin Films
Fitrilawati, Norman Syakir, Annisa Aprilia, Zhouyang Liu, Xinliang Feng, Christoph Bubeck
Universitas Padjadjaran, Materials Science Forum Vol 827 (2015) pp 317-320 © (2015) Trans Tech Publications, Switzerland doi:10.4028/www.scientific.net/MSF.827.317
Bahasa Inggris
Universitas Padjadjaran, Materials Science Forum Vol 827 (2015) pp 317-320 © (2015) Trans Tech Publications, Switzerland doi:10.4028/www.scientific.net/MSF.827.317
Annisa Aprilia, Christoph Bubeck, Fitrilawati, Norman Syakir, Xinliang Feng, Zhouyang Liu
We report an experimental study of thermal reduction of graphene oxide (GO) under nitrogen flow. Ultrathin films of GO were prepared on quartz glass substrates by spin-coating from 3 mg/ml aqueous solutions of GO. These films were annealed at 50°C under vacuum overnight before thermal reduction. The films were exposed to temperatures of 100 °C, 150 °C, 200 °C, 300°C, 400 °C, 500 °C and 800 °C under nitrogen flowing. We used UV-Vis absorption spectroscopy to monitor the change of absorption spectra caused by thermal reduction. We observed a significant change of absorption spectra due to formation of reduced graphene oxide (RGO). We found that thermal reduction started already at 100 °C, but proceeded significantly faster at heating temperatures higher than 200 °C.